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Shyamal Mondal

Visiting Fellow
  • Phone: +39 +39 0461 314180
  • FBK Povo
Short bio

Received Ph. D. from The University of Calcutta (research work at Saha Institute of Nuclear Physics) in 2018. Worked as an Assistant Professor in Physics in Maharaja Manindra Chandra College, Kolkata. Currently working as an ICTP-TRIL postdoctoral fellow at Fondazione Bruno Kessler, Trento, Italy.

Research interests
Nanoparticle and thin film production and their ion beam modification X-ray Photoelectron Spectroscopy Electron microscopy Atomic Force Microscopy Microfabrication
Publications
  1. ‘Pattern formation on ion-irradiated Si surface at energies where sputtering is negligible’, A. L. Cazalilla, D. Chowdhury, A. Ilinov, Shyamal Mondal, P. Barman, S. R. Bhattacharyya, D. Ghose, F. Djurabekova, K. Nordlund, and S. Norris, Journal of Applied Physics, 123, 235108 (2018)(I.F:2.17)
  2. ‘Growth dynamics of copper thin film deposited by soft-landing of size selected nanoclusters’, Shyamal Mondal, Debasree Chowdhury, Pintu Barman and S. R. Bhattacharyya, Euro Phys. J. D71, 327 (2017)( I.F:1.393)(Corresponding Author)
  3. S. Bhattacharjee, D. Lavanyakumar, V. Naik, S. Mondal, S.R. Bhattacharyya, P. Karmakar, ‘Nanomechanical properties of ion induced Si ripple patterns’, Thin Solid Films,645 (2017) 265-268(I.F:1.49)
  4. ‘Size and density controlled Ag nanocluster embedded MOS structure for memory applications’,  Debaleen Biswas, Shyamal Mondal, S. R. Bhattacharyya and Supratic Chakraborty Materials Science in Semiconductor Processing, 63, 1 (2017)
  5. ‘Oxidation behavior of copper nanofractals produced by soft-landing of size-selected nanoclusters’, Shyamal Mondaland S. R. Bhattacharyya, RSC Advances,  5, 99425 (2015)
  6. ‘Formation of Monodispersed Films from Size-Selected Copper Nanoclusters’, Shyamal Mondal, B. Satpati, S. R. Bhattacharyya, J. Nanosci. Nanotechnol. 15, 611 (2015)
  7. ‘Performance of a size-selected nanocluster deposition facility and in situ characterization of grown films by x-ray photoelectron spectroscopy’ Shyamal Mondal, S. R. Bhattacharyya, Rev. Sci. Instrum. 85, 065109 (2014) 
  8. ‘Morphological and optical properties of soft-landed supported nanoclusters: effect of rapid thermal annealing’, Shyamal Mondal, S. R. Bhattacharyya, Appl. Phys. A  116, 1621 (2014) (Corresponding author)
  9. ‘Wetting and Surface Energy of Vertically Aligned Silicon Nanowires’, S. Jana, S. Mondal and S. R. Bhattacharyya, J. Nanoscience & Nanotechnol.13, 3983 (2013) 
  10. ‘Growth process of GaAs ripples as a function of incident Ar-ion dose’, D. Datta, Shyamal Mondal, S. R. Bhattacharyya, Appl. Surf. Sci. 258, 4152 (2012) 

In peer-reviewed conference proceeding

  1. Shyamal Mondal, D. Chowdhury, and S. R. Bhattacharyya, ‘Oxygen adsorption by supported size-selected copper clusters: Substrate effects’, AIP Conference Proceedings Vol. 1832, 080084 (2017); (Corresponding author)
  2. ‘Characterization of submonolayer film composed of soft-landed copper nanoclusters on HOPG’, Shyamal Mondal, Pabitra Das, Debasree Chowdhury and S. R. Bhattacharyya, AIP Conf. Proc. 1665, 140040 (2015) (Corresponding author)
  3. ‘Evolution of nano-structures of silver due to rapid thermal annealing’, Shyamal Mondal, S. R. Bhattacharyya, AIP Conf. Proc. 1591, 1000 (2014) (Corresponding author)
  4. ‘Size-selected Copper Nanolclusters For Fabrication Of Isolated Size-controlled Nanostructures’, S. Mondal, S. Jana and S. R. Bhattacharyya, AIP Conf. Proc. 1536, 203 (2013). (Corresponding author)
  5. ‘Morphology of Size-selected Copper Nanocluster film, Shyamal Mondal, S. R. Bhattacharyya,  AIP Conf. Proc. 1447, 737 (2012) (Corresponding author)
  6. ‘Thermal diffusion-driven Island formation and fragmentation of size-selected Ag-nanocluster films’ P. Barman, A. Deka, Shyamal Mondal, D. Chowdhury and S. R. Bhattacharyya, AIP Conf. Proc. 2115, 030306 (2019)

Patent Applied (Indian Patent Office: http://www.ipindia.nic.in/)

“A METHOD OF INDEPENDENT CONTROL OVER SIZE AND DENSITY OF NANOPARTICLES FOR FABRICATING METAL NANOPARTICLE EMBEDDED MOS CAPACITOR AND A METAL NANOPARTICLE EMBEDDED MOS CAPACITOR THEREOF FOR NONVOLATILE MEMORY APPLICATIONS (201831001324 A)”